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QUASI-STOICHIOMETRIC SILICON NITRIDE THIN FILMS DEPOSITED BY REMOTE PLASMA-ENHANCED CHEMICAL-VAPOR DEPOSITION

Author(s):
Lucovsky, G.
Ma, Y.
He, S.S.
Yasuda, T.
Stephens, D.J.
Habermehl, S.
1 more
Publication title:
Amorphous insulating thin films : symposium held December 1-4, 1992, Boston, Massachusetts, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
284
Pub. date:
1993
Page(from):
33
Page(to):
38
Pages:
6
Pub. info.:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558991798 [1558991794]
Language:
English
Call no.:
M23500/284
Type:
Conference Proceedings

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