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DEPOSITION OF FLUORINE DOPED TUNGSTEN OXIDE THIN FILMS BY ATMOSPHERIC PRESSURE CHEMICAL VAPOR DEPOSITION

Author(s):
Publication title:
Microcrystalline semiconductors : materials science & devices : symposium held November 30-December 4, 1992, Boston, Massachusetts, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
283
Pub. Year:
1993
Page(from):
933
Page(to):
938
Pages:
6
Pub. info.:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558991781 [1558991786]
Language:
English
Call no.:
M23500/283
Type:
Conference Proceedings

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