THE HIGH TEMPERATURE STABILITY AND RELAXATION OF UHV/CVD SiGe THIN FILMS

THE HIGH TEMPERATURE STABILITY AND RELAXATION OF UHV/CVD SiGe THIN FILMS

Author(s):

Publication title:

Evolution of surface and thin film microstructure : symposium held November 30-December 4, 1992, Boston, Massachusetts, U.S.A.

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

280

Pub. Year:

1993

Page(from):

471

Page(to):

474

Pages:

4

Pub. info.:

Pittsburgh, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781558991750 [1558991751]

Language:

English

Call no.:

M23500/280

Type:

Conference Proceedings

Details

TDL ID:	ZA00015764
Series ID:	PA00000011
Conf. info. (Name):	Symposium on evolution of surface and thin film microstructure
Conf. info. (Number):	1992
Conf. info. (Venue):	Boston, MA, USA
Conf. info. (Date):	1992.11.30-1992.12.04

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