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HI/H2 ECR PLASMA ETCHING OF III-V SEMICONDUCTORS

Author(s):
Pearton, S. J.
Chakrabarti, U. K.
Katz, A.
Ren, F.
Fullowan, T. R.
Abernathy, C R.
Hobson, W. S.
2 more
Publication title:
Materials modification by energetic atoms and ions : symposium held April 28-30, 1992, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
268
Pub. date:
1992
Page(from):
17
Page(to):
22
Pages:
6
Pub. info.:
Pittsburgh, PA: Materials Research Society
ISSN:
02729172
ISBN:
9781558991637 [1558991638]
Language:
English
Call no.:
M23500/268
Type:
Conference Proceedings

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