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EFFECTS OF SILICON ION IMPLANTATION UPON THIN GATE OXIDE INTEGRITY

Author(s):
Lee, G.-S.
Park, J. -G.
Choi, S. -P.
Shin, C.-H,
Sun, Y.-B
Kwak, Y.-S.
Shin, C.-K.
Smith, W. L.
Hahn, S.
4 more
Publication title:
Defect engineering in semiconductor growth, processing and device technology : symposium held April 26-May 1, 1992, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
262
Pub. date:
1992
Page(from):
1043
Page(to):
1048
Pages:
6
Pub. info.:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558991576 [1558991573]
Language:
English
Call no.:
M23500/262
Type:
Conference Proceedings

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