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USE OF SELECTIVE AREA DEFECT CREATION FOR ISOLATION OF III-V MULTILAYER STRUCTURES

Author(s):
Pearton, S. J.
Ren, F.
Fullowan, T. R,
Katz, A.
Hobson, W. S.
Abernaty, C. R.
Lothian, J., R.
D'Asaro, L. A.
Elliman, R. G.
Ridgway, M. C.
Jagadish, C.
Williams,. J. S.
7 more
Publication title:
Defect engineering in semiconductor growth, processing and device technology : symposium held April 26-May 1, 1992, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
262
Pub. date:
1992
Page(from):
763
Page(to):
768
Pages:
6
Pub. info.:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558991576 [1558991573]
Language:
English
Call no.:
M23500/262
Type:
Conference Proceedings

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