QUICK TESTS FOR ELECTROMIGRATION: USEFUL BUT NOT WITHOUT DANGER

QUICK TESTS FOR ELECTROMIGRATION: USEFUL BUT NOT WITHOUT DANGER

Author(s):: Lloyd, J. R.
Publication title:: Advanced metallization and processing for semiconductor devices and circuits--II : symposium held April 27-May 1, 1992, San Francisco, California, U.S.A.
Title of ser.:: Materials Research Society symposium proceedings
Ser. no.:: 260
Pub. Year:: 1992
Page(from):: 735
Page(to):: 744
Pages:: 10
Pub. info.:: Pittsburgh, Pa.: Materials Research Society
ISSN:: 02729172
ISBN:: 9781558991552 [1558991557]
Language:: English
Call no.:: M23500/260
Type:: Conference Proceedings

Details

TDL ID:	ZA00015744
Series ID:	PA00000011
Conf. info. (Name):	Symposium on advanced metallization and processing for semiconductor devices and circuits
Conf. info. (Number):	2nd
Conf. info. (Venue):	San Francisco, CA, USA
Conf. info. (Date):	1992.04.27-1992.05.01

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