Blank Cover Image

MANUFACTURING AND TECHNOLOGY REQUIREMENTS FOR SUBMICRON MULTILEVEL METAL

Author(s):
Seidel T. E.  
Publication title:
Advanced metallization and processing for semiconductor devices and circuits--II : symposium held April 27-May 1, 1992, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
260
Pub. Year:
1992
Page(from):
3
Page(to):
18
Pages:
16
Pub. info.:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558991552 [1558991557]
Language:
English
Call no.:
M23500/260
Type:
Conference Proceedings

Similar Items:

Seidel, T.E., Vasudev, P.K., Stanley, T.

Electrochemical Society

Mautz, K., Alzaben, T.

Electrochemical Society

Brillouet, M.

MRS - Materials Research Society

Suguro, K., Iinuma, T., Ohuchi, K., Miyashita, K., Akutsu, H., Yoshimura, H., Akasaka, Y., Nakajima, K., Miyano, K., …

MRS - Materials Research Society

Uzoh, C.E., Wang, T., Talieh, H., Basol, B.M.

Electrochemical Society

Kizilyalli,I.C., Abein,G., Chen,Z., Weber,G.R., Register,F., Harris,E., Chetlur,S., Higashi,G.S., Schofieled,M., Sen,S., …

SPIE-The International Society for Optical Engineering

Lin, M., Chang, C., Huang, T., Lin, H.

Materials Research Society

P. Seidel

SPIE - The International Society of Optical Engineering

Z. Xu, K. Ngan, J. VanGogh, R. Mosely, Y. Tanaka

Society of Photo-optical Instrumentation Engineers

11 Conference Proceedings Submicron Technology

Beenakker M. I. C., Bootsma K. S.

Kluwer Academic Publishers

K. Mikagi, K. Urabe, T. Katoh, M. Sekine, Y. Murao

Electrochemical Society

1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12