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SURFACE CHARACTERISATION OF Si AFTER HF TREATMENTS AND ITS INFLUENCE ON THE DIELECTRIC BREAKDOWN OF THERMAL OXIDES

Author(s):
Verhaverbeke, S.
Alay, J.
Mertens, P.
Meuris, M.
Heyns, M.
Vandervorst, W.
Murrell, M.
Sofield, C.
3 more
Publication title:
Chemical surface preparation, passivation, and cleaning for semiconductor growth and processing : symposium held April 27-29, 1992, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
259
Pub. Year:
1992
Page(from):
391
Page(to):
398
Pages:
8
Pub. info.:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558991545 [1558991549]
Language:
English
Call no.:
M23500/259
Type:
Conference Proceedings

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