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CHARACTERISTICS AND RECOVERY OF Si SURFACES PLASMA ETCHING IN CHF3/C2F6

Author(s):
Park, H.-H.
Kwon, K.H.
Koak, B.-H.
Lee, S.-M.
Kwon, O-J.
Kim, B.-W.
Lee, J.-W.
Yoo, J.-B.
Sung, Y.-K.
4 more
Publication title:
Chemical surface preparation, passivation, and cleaning for semiconductor growth and processing : symposium held April 27-29, 1992, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
259
Pub. date:
1992
Page(from):
219
Page(to):
224
Pages:
6
Pub. info.:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558991545 [1558991549]
Language:
English
Call no.:
M23500/259
Type:
Conference Proceedings

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