*PHOTO-EXCITED CLEANING OF SILICON WITH CHLORINE AND FLUORINE
- Author(s):
Ito, T. Sugino, R. Sato, Y. Okuno, M. Osawa, A. Aoyama, T. Yamazaki, T. Arimoto, Y. - Publication title:
- Chemical surface preparation, passivation, and cleaning for semiconductor growth and processing : symposium held April 27-29, 1992, San Francisco, California, U.S.A.
- Title of ser.:
- Materials Research Society symposium proceedings
- Ser. no.:
- 259
- Pub. Year:
- 1992
- Page(from):
- 195
- Page(to):
- 206
- Pages:
- 12
- Pub. info.:
- Pittsburgh, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558991545 [1558991549]
- Language:
- English
- Call no.:
- M23500/259
- Type:
- Conference Proceedings
Similar Items:
MRS - Materials Research Society |
Materials Research Society |
Electrochemical Society |
Materials Research Society |
3
Conference Proceedings
Fe REMOVAL EFFECTS OF SILICON CHLORIDES (SiCl R) DURING UV/Cl2 DRY CLEANING
Electrochemical Society |
MRS - Materials Research Society |
4
Conference Proceedings
Charge Damage Caused by Electron Shading Effect During Sputter Etch Pre-Cleaning of Via Contact
Electrochemical Society |
Electrochemical Society |
5
Conference Proceedings
CLEANING OF SiO2 BULK LAYERS WITH SUCCESSIVE PROCESSING OF POLY-Si CVD AND UV/Cl2
Electrochemical Society |
11
Conference Proceedings
THE MECHANISM OF COPPER REMOVAL FROM A BARE SILICON SURFACES WITH ULTRAVIOLET EXCITED CHLORINE
Electrochemical Society |
SPIE-The International Society for Optical Engineering |
Society of Plastics Engineers, Inc. (SPE) |