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IN SITU CONTAMINATION CONTROL INVESTIGATION OF SILICON NITRIDE LOW PRESSURE CHEMICAL VAPOR DEPOSITION PROCESS IN VERTICAL THERMAL REACTORS

Author(s):
Moinpour, Mansour
Bohannan, K.
Shenasa, M.
Sharif, A.
Guzzo, G.
Brestovansky, D.F.
Markle, R.J.
Wilkes, R.
3 more
Publication title:
Chemical surface preparation, passivation, and cleaning for semiconductor growth and processing : symposium held April 27-29, 1992, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
259
Pub. Year:
1992
Page(from):
179
Page(to):
186
Pages:
8
Pub. info.:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558991545 [1558991549]
Language:
English
Call no.:
M23500/259
Type:
Conference Proceedings

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