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*IN SITU LOW TEMPERATURE CLEANING AND PASSIVATION OF SILICON BY REMOTE HYDROGEN PLASMA FOR SILICON-BASED EPITAXY

Author(s):
Banerjee, S.
Tasch, A.
Hsu, T.
Qian, R.
Kinosky, D.
Irby, J.
Mahajan, A.
Thomas, S.
3 more
Publication title:
Chemical surface preparation, passivation, and cleaning for semiconductor growth and processing : symposium held April 27-29, 1992, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
259
Pub. Year:
1992
Page(from):
43
Page(to):
54
Pages:
12
Pub. info.:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558991545 [1558991549]
Language:
English
Call no.:
M23500/259
Type:
Conference Proceedings

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