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SURFACE CHEMISTRY OF FLUORINE-CONTAINING MOLECULES RELATED TO CVD PROCESS ON SILICON NITRIDE: SiF4, XeF2, AND HF

Author(s):
Outka, Duane A.  
Publication title:
Chemical vapor deposition of refractory metals and ceramics II : symposium held December 4-6, 1991, Boston, Massachusetts, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
250
Pub. Year:
1992
Page(from):
79
Page(to):
84
Pages:
6
Pub. info.:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558991446 [1558991441]
Language:
English
Call no.:
M23500/250
Type:
Conference Proceedings

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