Blank Cover Image

AN INVESTIGATION INTO THE USE OF A DIFFUSION BARRIER IN THE MICROWAVE PLASMA ASSISTED CHEMICAL VAPOR DEPOSITION OF DIAMOND ON IRON BASED SUBSTRATES

Author(s):
Weiser, Paul S.
Prawer, S.
Hoffman, A.
Manory, R.
Paterson, P.J.K.
Stuart, S-A.
1 more
Publication title:
Wide band gap semiconductors : symposium held December 2-6, 1991, Boston, Massachusetts, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
242
Pub. Year:
1992
Page(from):
63
Page(to):
68
Pages:
6
Pub. info.:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558991361 [1558991360]
Language:
English
Call no.:
M23500/242
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings INVESTIGATION OF DIAMOND PARTICLES GROWN BY MICROWAVE PLASMA CVD ON TUNGSTEN WIRE TIPS

Stuart, Sue-Anne, Prawer, Steven, Hoffman, Alon, Moodie, Alec, Weiser, Paul

Materials Research Society
7 Conference Proceedings Preparation and Research on Microwave Plasma Chemical Vapor Deposition Diamond Films on SiC Substrate

H. Wang, Y.H. Wu, K. Zhang

Trans Tech Publications
2 Conference Proceedings SYNTHESIS OF CARBO-NITRIDE FILMS USING HIGH-ENERGY SHOCK PLASMA DEPOSITION

Gurarie, V. N., Orlov, A. V., Nugent, K. W., Weiser, P., Prawer, S.

MRS - Materials Research Society
8 Conference Proceedings Investigation of Nanocrystalline Diamond Films Prepared by Microwave Plasma Chemical Vapor Deposition

Popov, C., Kulisch, W.

Electrochemical Society
3 Conference Proceedings Epitaxial Growth of Diamond on an Iridium (100) Substrate by Microwave Plasma-Assisted Chemical Vapor Deposition

Tsubota, T., Tsuruga, S., Saito, T., Kusakabe, K., Morooka, S., Maeda, H.

MRS - Materials Research Society
9 Conference Proceedings Stress in Microwave Plasma Chemical Vapor Deposited (MPCVD) Diamond Films

Naseem, H.A., Haque, M.S., Beera, R.A., Brown, W.D., Malshe, A.P.

Electrochemical Society
4 Conference Proceedings Homoepitaxially Grown Boron-Doped Diamond Thin Film Using Trimethylboron as a Dopant by Microwave Plasma-Assisted Chemical Vapor Deposition

Saito, T., Ohtsubo, K., Tsuruga, S., Kameta, M., Maeda, H., Kusakabe, K., Morooka, S., Kiyota, Hideo

Electrochemical Society
10 Conference Proceedings MICROWAVE ASSISTED CHEMICAL VAPOR INFILTRATION

Devlin, D.J., Currier, R.P., Barbero, R.S., Espinoza, B.F., Elliott, N.

Materials Research Society
5 Conference Proceedings Influence of Substrate Placement on Plasma-Assisted Chemical Vapor Deposition of Diamond

Koemtzopoulos, C.R., Economou, D.J., Pollard, R.

American Institute of Chemical Engineers
11 Conference Proceedings Thermal Stability of Nanocrystalline Diamond Films Grown by Microwave Plasma Chemical Vapor Deposition

Bulut, Mevlut, Catledge, Shane A., Vohra, Yogesh K., Camata, Renato P.

Materials Research Society
6 Conference Proceedings THE EARLY STAGES OF MICROWAVE-ASSISTED CHEMICAL VAPOR DEPOSITION OF DIAMOND ON FUSED SILICA SUBSTRATES

Rankin, J., Shigesato, Y., Boekenhauer, R.E., Csencsits, R., Paine, D.C., Sheldon, B.W.

Materials Research Society
12 Conference Proceedings Plasma-Assisted Deposition at Atmospheric Pressure Using Dielectric Barrier Discharges

C.-P. Klages, K. Höpfner, N. Kläke, R. Thyen

Society of Vacuum Coaters
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12