Blank Cover Image

PROPERTIES OF Si02 FILMS FABRICATED BY MICROWAVE ECR PLASMA PROCESSING WITH AND WITHOUT ENERGETIC PARTICLE BOMBARDMENT DURING FILM DEPOSITION PART I. FABRICATION PROCESSES AND PHYSICAL PROPERTIES

Author(s):
Publication title:
Low energy ion beam and plasma modification of materials : symposium held April 30-May 2, 1991, Anaheim, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
223
Pub. date:
1991
Page(from):
69
Page(to):
74
Pages:
6
Pub. info.:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558991170 [1558991174]
Language:
English
Call no.:
M23500/223
Type:
Conference Proceedings

Similar Items:

Sano, K., Tamamaki, H., Nomura, M., Wickramanayaka, S., Nakanishi, Y., Hatanaka, Y.

MRS - Materials Research Society

Chau, T. T., Lam, P. M., Kao, K. C.

MRS - Materials Research Society

F. Li, T. Guo, K.C. Zhang, C.P. Chen, Q.R. Feng

Trans Tech Publications

Jin, Ming, Kao, Kwan C

Materials Research Society

Ozaki, S., Akahori, T., Tani, T., Nakayama, S.

Materials Research Society

Lee, J.S., Bae, J.S., Song, H.W., Jun, B.H., Gorman, J., Jiang, Z.-T., No, K.

Electrochemical Society

Amit Misra, Michael Nastasi

Springer

Jin, Ming, Kao, Kwan C.

Materials Research Society

Sano, K., Tamamaki, H., Nomura, M., Wickramanayaka, S., Nakanishi, Y., Hatanaka, Y.

MRS - Materials Research Society

6 Conference Proceedings Modified ECR Plasma Deposition

Nakamura,S., Akahori,T., Nakayama,S.

Trans Tech Publications

1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12