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PROPERTIES OF Si02 FILMS FABRICATED BY MICROWAVE ECR PLASMA PROCESSING WITH AND WITHOUT ENERGETIC PARTICLE BOMBARDMENT DURING FILM DEPOSITION PART I. FABRICATION PROCESSES AND PHYSICAL PROPERTIES

Author(s):
Publication title:
Low energy ion beam and plasma modification of materials : symposium held April 30-May 2, 1991, Anaheim, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
223
Pub. Year:
1991
Page(from):
69
Page(to):
74
Pages:
6
Pub. info.:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558991170 [1558991174]
Language:
English
Call no.:
M23500/223
Type:
Conference Proceedings

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