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ANALYSIS AND CALIBRATION OF THE FLOW CHARACTERISTICS OF A PRESSURE CONTROLLED VAPOR SOURCE FOR GAS SOURCE DOPING: CdTe:I

Author(s):
Rajavel, D.
Wagner, B. K.
Maruyama, K.
Benz II, R. G.
Conte, A.
Summers, C. J.
1 more
Publication title:
Atomic layer growth and processing : symposium held April 29 - May 1, 1991, Anaheim, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
222
Pub. date:
1991
Page(from):
275
Page(to):
282
Pages:
8
Pub. info.:
Pittsburgh: Materials Research Society
ISSN:
02729172
ISBN:
9781558991163 [1558991166]
Language:
English
Call no.:
M23500/222
Type:
Conference Proceedings

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