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MULTI-WAFER ATOMIC LAYER EPITAXY REACTOR FOR DEVICE QUALITY GaAs

Author(s):
Publication title:
Atomic layer growth and processing : symposium held April 29 - May 1, 1991, Anaheim, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
222
Pub. Year:
1991
Page(from):
157
Page(to):
162
Pages:
6
Pub. info.:
Pittsburgh: Materials Research Society
ISSN:
02729172
ISBN:
9781558991163 [1558991166]
Language:
English
Call no.:
M23500/222
Type:
Conference Proceedings

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