Blank Cover Image

SILICON GERMANIUM HETEROBIPOLAR TRANSISTOR STRUCTURES WITH EXTREMELY HIGH BASE DOPING

Author(s):
Publication title:
Silicon molecular beam epitaxy : symposium held April 29-May 3, 1991, Anaheim, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
220
Pub. date:
1991
Page(from):
451
Page(to):
456
Pages:
6
Pub. info.:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558991149 [155899114X]
Language:
English
Call no.:
M23500/220
Type:
Conference Proceedings

Similar Items:

Kasper, E.

Electrochemical Society

Presting, H., Menczigar, U., Abstreiter, G., Kibbel, H., Kasper, E.

Materials Research Society

Hansch, W., Eisele, I., Kibbel, H., Konig, U.

MRS - Materials Research Society

Menczigar, U., Abstreiter, G., Kibbel, H., Presting, H., Kasper, E.

Materials Research Society

Kasper,Erich, Reitemann,G., Eberhardt,Jochen

SPIE - The International Society for Optical Engineering

Jager, W., Leifer, K., Ehrhart, P., Kasper, E., Kibbel, H.

Materials Research Society

E. Kasper

Trans Tech Publications

Subramanian,V., Saraswat,K.C., Hovagimian,H., Mehlhaff,J.

SPIE-The International Society for Optical Engineering

Presting, H., Uschmann, J., Hepp, M., Thonke, K., Sauer, R., Kibbel, H., Cabanski, W., Jaros, M.

SPIE

Gruhle, A., Kibbel, H., Schurr, A., Behammer, D., Koenig, U.

Electrochemical Society

Presting,H., Konle,J., Hepp,M., Kibbel,H., Thonke,K., Sauer,R., Cabanski,W.A., Jaros,M.

SPIE - The International Society for Optical Engineering

Yang, D., Li, H., Yu, X., Ma, X., Tian, D., Li, L., Qua, S.

Electrochemical Society

1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12