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THE EFFECT OF OXYGEN ON THE THERMAL STABILITY OF Si1-x Gex STRAINED LAYERS GROWN BY LIMITED REACTION PROCESSING

Author(s):
Nobel, D.B.
Hoyt, J.L.
Kuo, P.
Nix, W.D.
Gibbons, J.F.
Laderman, S.S.
Turner, J.E.
Rosner, S.J.
Scott, M.P.
4 more
Publication title:
Silicon molecular beam epitaxy : symposium held April 29-May 3, 1991, Anaheim, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
220
Pub. date:
1991
Page(from):
247
Page(to):
252
Pages:
6
Pub. info.:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558991149 [155899114X]
Language:
English
Call no.:
M23500/220
Type:
Conference Proceedings

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