Blank Cover Image

DEPOSITION OF HEAVILY-DOPED μc-SILICON THIN FILMS BY REMOTE PLASMA-ENHANCED CHEMICAL-VAPOR DEPOSITION PROCESS (remote PECVD)

Author(s):
Publication title:
Chemical perspectives of microelectronic materials II : symposium held November 26-28, 1990, Boston, Massachusetts, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
204
Pub. Year:
1991
Page(from):
277
Page(to):
282
Pages:
6
Pub. info.:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558990968 [1558990968]
Language:
English
Call no.:
M23500/204
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings DEPOSITION AND CHARACTERIZATION OF NEAR ‘INTRINSIC” μc-Si FILMS DEPOSITED BY REMOTE PLASMA-ENHANCED CHEMICAL-VAPOR DEPOSITION -RPECVD

Williams, M.J., Wang, C., Lucovsky, G.

Materials Research Society
7 Conference Proceedings INTRINSIC GROWTH STRESS IN THERMALLY GROWN AND ANNEALED SiO2 THIN FILMS: CONTROL OF STRESS-INDUCED ELECTRONICALLY ACTIVE DEFECTS AT Si/SiO2 INTERFACES

Bjorkman, C.H., Lee, D.R., Lucovsky, G.

Materials Research Society
2 Conference Proceedings STUDIES OF MOS HETEROJUNCTION DEVICES USING DOPED μc-Si AND a-Si

Lee, D.R., Bjorkman, C.H., Wang, C., Lucovsky, G.

Materials Research Society
8 Conference Proceedings DEPOSITION OF GaN BY REMOTE PLASMA-ENHANCED CHEMICAL-VAPOR DEPOSITION (Remote PECVD)

Choi, S.W., Bachmann, K.J., Lucovsky, G.

Materials Research Society
3 Conference Proceedings Deposition of Device-Quality Dielectric Thin Films by Remote Plasma-Enhanced Chemical-Vapor Deposition (RPECVD) and Rapid Thermal Annealing (RTA)

Lucovsky, G., Lu, Z., Lee, D.R.

American Institute of Chemical Engineers
9 Conference Proceedings BONDED HYDROGEN IN SILICON OXIDE THIN FILMS DEPOSITED BY REMOT PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION

Tsu, D. V., Lucovsky, G.

Materials Research Society
4 Conference Proceedings DEPOSITION OF AMORPHOUS AND MICROCRYSTALLINE Si,C ALLOY THIN FILMS BY A REMOTE PLASMA-ENHANCED CHEMICAL-VAPOR DEPOSITION PROCESS

Wang, C., Lucovsky, G., Nemanich, R.J.

Materials Research Society
10 Conference Proceedings QUASI-STOICHIOMETRIC SILICON NITRIDE THIN FILMS DEPOSITED BY REMOTE PLASMA-ENHANCED CHEMICAL-VAPOR DEPOSITION

Lucovsky, G., Ma, Y., He, S.S., Yasuda, T., Stephens, D.J., Habermehl, S.

Materials Research Society
5 Conference Proceedings μc SILICON THIN FILMS DEPOSITED BY REMOTE PLASMA ENHANCED CHEMICAL VAPOR DEPOSITORS PROCESS

Wang, C, Parsons, G. N., Kim, S. S., Buehler, E. C., Nemanich, R. J., Locuvsky, G.

Materials Research Society
11 Conference Proceedings Bonding of Hydrogen and Deuterium in Silicon Nitride Films Prepared by Remote Plasma Enhanced Chemical Vapor Deposition

Stevens, G., Santos-Filho, P., Habermehl, S., Lucovsky, G.

MRS - Materials Research Society
6 Conference Proceedings Process Diagnostics for Remote Plasma-Enhanced Chemical Vapor Desposition (PECVD) of Silicon Nitrides

Banerjee, A., Lucovsky, G.

MRS - Materials Research Society
12 Conference Proceedings Hydrogen Assisted Remote Plasma Enhanced Chemical Vapor Deposition of Amorphous Silicon Nitride Films

Santos-Filho, P., Koh, K., Stevens, G., Lucovsky, G.

MRS - Materials Research Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12