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Si(100) SURFACE PREPARATION BY IN-SITU OR IN-VACUO EXPOSURE TO REMOTELY PLASMA-GENERATED ATOMIC HYDROGEN: APPLICATIONS TO DEPOSITED SiO2 AND EPITAXIAL GROWTH OF Si

Author(s):
Yasuda, T.
Ma, Y.
Habermehl, S.
Kim, S.S.
Lucovsky, G.
Schneider, T.P.
Cho, J.
Nemanich R.J.
3 more
Publication title:
Evolution of thin-film and surface microstructure : symposium held November 26-December 1, 1990, Boston, Massachusetts, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
202
Pub. Year:
1991
Page(from):
395
Page(to):
400
Pages:
6
Pub. info.:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558990944 [1558990941]
Language:
English
Call no.:
M23500/202
Type:
Conference Proceedings

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