Blank Cover Image

INTRINSIC GROWTH STRESS IN THERMALLY GROWN AND ANNEALED SiO2 THIN FILMS: CONTROL OF STRESS-INDUCED ELECTRONICALLY ACTIVE DEFECTS AT Si/SiO2 INTERFACES

Author(s):
Publication title:
Evolution of thin-film and surface microstructure : symposium held November 26-December 1, 1990, Boston, Massachusetts, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
202
Pub. date:
1991
Page(from):
271
Page(to):
276
Pages:
6
Pub. info.:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558990944 [1558990941]
Language:
English
Call no.:
M23500/202
Type:
Conference Proceedings

Similar Items:

Bjorkman, C. H., Fitch, J. T., Lucovsky, G.

Materials Research Society

Katzer,D., Gerth,D., Riesenberg,R.

Trans Tech Publications

Fitch, J.T., Bjorkman, C.H., Sumakeris, J.J., Lucovsky, G.

Materials Research Society

Lucovsky, G., Niimi, H., Koh, K., Lee, D.R., Jing, Z.

Electrochemical Society

Wang, C:, Bjorkman, C.H., Lee, D.R., Williams, M.J., Lucovsky, G.

Materials Research Society

Bjorkman, C. H., Lucovsky, G.

Materials Research Society

Yasuda, T., Lee, D. R., Bjorkman, C. H., Ma, Y., Lucovsky, G., Emmerichs, U., Meyer, C., Leo, K., Kurz, H.

MRS - Materials Research Society

Yang, C.H., Chen, P.C.

Materials Research Society

Lucovsky, G., Lu, Z., Lee, D.R.

American Institute of Chemical Engineers

Lee, D.R., Bjorkman, C.H., Wang, C., Lucovsky, G.

Materials Research Society

Yang, C. H., Chen, P. C.

Materials Research Society

1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12