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HIGH DOSE RATE OXYGEN IMPLANTATION FOR FORMATION OF SILICON-ON-INSULATOR STRUCTURES

Author(s):
Publication title:
Surface chemistry and beam-solid interactions : symposium held November 26-29, 1990, Boston, Massachusetts, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
201
Pub. date:
1991
Page(from):
259
Page(to):
264
Pages:
6
Pub. info.:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558990074 [1558990070]
Language:
English
Call no.:
M23500/201
Type:
Conference Proceedings

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