SUBSTRATE TEMPERATURE EFFECTS ON PROPERTIES OF SILICON NITRIDE FILMS DEPOSITED BY ION BEAM ASSISTED DEPOSITION

SUBSTRATE TEMPERATURE EFFECTS ON PROPERTIES OF SILICON NITRIDE FILMS DEPOSITED BY ION BEAM ASSISTED DEPOSITION

Author(s):

Publication title:

Surface chemistry and beam-solid interactions : symposium held November 26-29, 1990, Boston, Massachusetts, U.S.A.

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

201

Pub. Year:

1991

Page(from):

111

Page(to):

116

Pages:

6

Pub. info.:

Pittsburgh, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781558990074 [1558990070]

Language:

English

Call no.:

M23500/201

Type:

Conference Proceedings

Details

TDL ID:	ZA00015685
Series ID:	PA00000011
Conf. info. (Name):	Symposium on surface chemistry and beam-solid interactions
Conf. info. (Number):	1990
Conf. info. (Venue):	Boston, MA, USA
Conf. info. (Date):	1990.11.26-1990.11.29

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