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DENSITY OF STATES OF AMORPHOUS GERMANIUM THIN FILMS DEPOSITED BY THE PECVD OF H2-DILUTED GERMANE

Author(s):
Godet, C.
Chu, V.
Equer, B.
Bouizem, Y.
Chahed, L.
Zawawi, El
Theye, M. L.
Basrour, S
Bruyere, J. C.
Stoquert, J. P.
5 more
Publication title:
Amorphous silicon technology, 1990 : symposium held April 17-20, 1990, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
192
Pub. Year:
1990
Page(from):
163
Page(to):
168
Pages:
6
Pub. info.:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558990814 [155899081X]
Language:
English
Call no.:
M23500/192
Type:
Conference Proceedings

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