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MAGNETRON REACTIVE ION ETCHING OF GaAs: PLASMA CHEMICAL ASPECTS AND SURFACE DAMAGE STUDIES

Author(s):
McLane, G. F
Meyyappan, M.
Taysing-Lara, M,.
Cole, M. W.
Wren, C.
Yerke, L.
eckart, D.
2 more
Publication title:
Plasma processing and synthesis of materials III : symposium held April 17-19, 1990, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
190
Pub. Year:
1991
Page(from):
285
Page(to):
290
Pages:
6
Pub. info.:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558990791 [1558990798]
Language:
English
Call no.:
M23500/190
Type:
Conference Proceedings

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