Blank Cover Image

PLASMA PARAMETER AND FILM QUALITY IN THE ECR-PLASMA-CVD

Author(s):
Publication title:
Plasma processing and synthesis of materials III : symposium held April 17-19, 1990, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
190
Pub. Year:
1991
Page(from):
261
Page(to):
266
Pages:
6
Pub. info.:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558990791 [1558990798]
Language:
English
Call no.:
M23500/190
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings HIGH RATE DEPOSITION OF HYDROGENATED AMORPHOUS SILICON FILMS BY ECR PLASMA CVD

Ozaki, S., Akahori, T., Tani, T., Nakayama, S.

Materials Research Society
7 Conference Proceedings Modified ECR Plasma Deposition

Nakamura,S., Akahori,T., Nakayama,S.

Trans Tech Publications
2 Conference Proceedings PROPERTIES OF DOPED a-Si:H FILMS DEPOSITED BY ECR PLASMA CVD

Murai, H., Hayama, M., Kobayashi, K., Yamazaki, T.

Materials Research Society
8 Conference Proceedings Deposition of High Quality SiO2 Films Using TEOS by ECR Plasma

Sano, K., Tamamaki, H., Nomura, M., Wickramanayaka, S., Nakanishi, Y., Hatanaka, Y.

MRS - Materials Research Society
3 Conference Proceedings SYNTHESIS OF HIGHLY PHOTOSENSITIVE a-SiC:H FILMS AT HIGH DEPOSITION RATE BY PLASMA DECOMPOSITION OF SiH4 AND C2H2

Nakayama, Y., Akita, S., Wakita, K., Kawamura, T.

Materials Research Society
9 Conference Proceedings Electron Beam Excited Plasma CVD for Silicon Growth

Okitsu, K., Imaizumi, M., Ito, T., Yamaguchi, K., Yamaguchi, M., Hara, T., Ban, M., Tokai, M., Kawamura, K.

MRS - Materials Research Society
4 Conference Proceedings DEFECT STRUCTURE OF SiON FILMS PREPARED BY ECR PLASMA CVD METHOD

Izumi, T., Matsumori, T., Kitagawa, M., Hirao, T.

Materials Research Society
10 Conference Proceedings Low Temperature Deposition of SiC Thin Films on Polymers Surface by ECR Plasma CVD

Sano, K., Nomura, M., Tamamaki, H., Hatanaka, Y.

Electrochemical Society
5 Conference Proceedings Stress of ECR Plasma CVD Si3N4 Films on FZ-Si

Zaitsu, Y., Shimizu, T., Matsumoto, S., Yosbida, M., Abe, T., Arai, E.

Electrochemical Society
11 Conference Proceedings Methylamine growth of SiCN films using ECR-CVD

Wen, C-Y., Wu, J-J., Lo, H. J., Chen, L. C., Chen, K. H., Lin, S. T., Yu, Y-C., Wang, C-W., Lin, E-K.

MRS-Materials Research Society
6 Conference Proceedings THE EFFECTS OF DEPOSITION PARAMETERS ON THE PROPERTIES OF SiO2 FILMS DEPOSITED BY MICROWAVE ECR PLASMAS

Chau, T. T., Lam, P. M., Kao, K. C.

MRS - Materials Research Society
12 Conference Proceedings Low Temperature Fabrication of (Ba,Sr)TiO3 Thin Films by ECR Plasma CVD

Kato, Y., Yabuta, H., Sone, S., Yamaguchi, H., Iizuka, T., Yamamichi, S., Lesaicherre, P-Y., Nishimoto, S., Yoshida, M.

MRS - Materials Research Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12