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IMPACT OF VARIOUS POLYSILICON DEPOSITION PROCESS ON THIN GATE-OXIDE PROPERTIES IN SUBMICRON CMOS TECHNOLOGY

Author(s):
Rot, P. K.
Kook, T.
Kannan, V. C.
Felton, G. J.
Powell, R. A.
Velaga, A. N.
1 more
Publication title:
Polysilicon thin films and interfaces
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
182
Pub. Year:
1990
Page(from):
281
Page(to):
286
Pages:
6
Pub. info.:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558990715 [1558990712]
Language:
English
Call no.:
M23500/182
Type:
Conference Proceedings

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