ELECTRON SPIN RESONANCE STUDIES OF SILICON DIOXIDE FILMS ON SILICON IN INTEGRATED CIRCUITS USING SPIN DEPENDENT RECOMBINATION

ELECTRON SPIN RESONANCE STUDIES OF SILICON DIOXIDE FILMS ON SILICON IN INTEGRATED CIRCUITS USING SPIN DEPENDENT RECOMBINATION

Author(s):

Publication title:

Atomic scale structure of interfaces : symposium held November 27-29, 1989, Boston Massachusetts, U.S.A.

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

159

Pub. Year:

1990

Page(from):

191

Page(to):

196

Pages:

6

Pub. info.:

Pittsburgh, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781558990470 [155899047X]

Language:

English

Call no.:

M23500/159

Type:

Conference Proceedings

Details

TDL ID:	ZA00015643
Series ID:	PA00000011
Conf. info. (Name):	Symposium on atomic scale structure of interfaces
Conf. info. (Number):	1989
Conf. info. (Venue):	Boston, MA, USA
Conf. info. (Date):	1989.11.27-1989.1129

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