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DETAILED STUDY OF ION BOMBARDMENT IN RF GLOW DISCHARGE DEPOSITION SYSTEMS: THE ROLE OF HELIIUM DILUTION

Author(s):
Cabarrocas, Roca P.  
Publication title:
Amorphous silicon technology, 1989 : symposium held April 25-28, 1989, San Diego, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
149
Pub. Year:
1989
Page(from):
33
Page(to):
38
Pages:
6
Pub. info.:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558990227 [1558990224]
Language:
English
Call no.:
M23500/149
Type:
Conference Proceedings

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