DIFFUSION, SEGREGATION, AND RECRYSTALLIZATION IN HIGH-DOSE ION-IMPLANTED Si

DIFFUSION, SEGREGATION, AND RECRYSTALLIZATION IN HIGH-DOSE ION-IMPLANTED Si

Author(s):: Pennycook, S. J.
Publication title:: Ion beam processing of advanced electronic materials : symposium held April 25-27, 1989, San Diego, California, U.S.A.
Title of ser.:: Materials Research Society symposium proceedings
Ser. no.:: 147
Pub. Year:: 1989
Page(from):: 45
Page(to):: 52
Pages:: 8
Pub. info.:: Pittsburgh, Pa.: Materials Research Society
ISSN:: 02729172
ISBN:: 9781558990203 [1558990208]
Language:: English
Call no.:: M23500/147
Type:: Conference Proceedings

Details

TDL ID:	ZA00015632
Series ID:	PA00000011
Conf. info. (Name):	Symposium on ion beam processing of advanced electronic materials
Conf. info. (Number):	1989
Conf. info. (Venue):	San Diego, CA, USA
Conf. info. (Date):	1989.04.25-1989.04.27

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