A SELF-ALIGNED SILICIDE TECHNOLIGY USING ION-BEAM MIXING, DOPED SILICIDE AND RAPID THERMAL PROCESSING

A SELF-ALIGNED SILICIDE TECHNOLIGY USING ION-BEAM MIXING, DOPED SILICIDE AND RAPID THERMAL PROCESSING

Author(s):

Publication title:

Rapid thermal annealing/chemical vapor deposition and integrated processing : sympoisium held April 25-28, 1989, San Diego, California, U.S.A.

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

146

Pub. Year:

1989

Page(from):

249

Page(to):

254

Pages:

6

Pub. info.:

Pittsburgh, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781558990197 [1558990194]

Language:

English

Call no.:

M23500/146

Type:

Conference Proceedings

Details

TDL ID:	ZA00015631
Series ID:	PA00000011
Conf. info. (Name):	Symposium on rapid thermal annealing/chemical vapor deposition and integrated processing
Conf. info. (Number):	1989
Conf. info. (Venue):	San Diego, CA, USA
Conf. info. (Date):	1989.04.25-1989.04.28

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