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*EPITAXIAL GROWTH OF Si1-XGeX/Si HETEROSTRUCTURES BY LIMITED REACTION PROCESSING FOR MINORITY CARRIER DEVICE APPLICATIONS

Author(s):
King, C. A.
Hoyt, J. L.
Noble, D. B
Gronet, C. M.
Gibbons, J. F.
Scott, M. P.
Laderman, S. S.
Kamains, T. I.
Turner, J.
4 more
Publication title:
Rapid thermal annealing/chemical vapor deposition and integrated processing : sympoisium held April 25-28, 1989, San Diego, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
146
Pub. Year:
1989
Page(from):
71
Page(to):
82
Pages:
12
Pub. info.:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558990197 [1558990194]
Language:
English
Call no.:
M23500/146
Type:
Conference Proceedings

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