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SURFACE CONDITION IN THE PLASMA-CVD OF a-Si:H,F FROM SiF4 AND H2

Author(s):
Maruyama, A.
Shen, D.S.
Chu, V.
Liu, J.Z.
Jaroker, J.
Campbell, I.
Fauchet, P.M.
Wagner, S.
3 more
Publication title:
Chemical perspectives of microelectronic materials : symposium held November 30-December 2, 1988, Boston, Massachusetts, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
131
Pub. Year:
1989
Page(from):
203
Page(to):
208
Pages:
6
Pub. info.:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558990043 [1558990046]
Language:
English
Call no.:
M23500/131
Type:
Conference Proceedings

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