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EFFECT OF ION BOMBARDMENT ON THE DOPANT DIFFUSION DURING REACTIVE ION ETCHING (RIE) OF DIELECTRIC FILMS DEPOSITED ON SILICON

Author(s):
Publication title:
Processing and characterization of materials using ion beams : symposium held November 28-December 2, 1988, Boston, Massachusetts, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
128
Pub. Year:
1989
Page(from):
731
Page(to):
736
Pages:
6
Pub. info.:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558990012 [1558990011]
Language:
English
Call no.:
M23500/128
Type:
Conference Proceedings

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