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DAMAGE REMOVAL AND ACTIVAITON IN RAPID-THERMALLY-ANNEALED SILICON IMPLANTED SEMI-INSULATING GaAs

Author(s):
Publication title:
Advanced surface processes for optoelectronics : symposium held April 5-8, 1988, Reno, Nevada, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
126
Pub. Year:
1988
Page(from):
207
Page(to):
214
Pages:
8
Pub. info.:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9780931837968 [0931837960]
Language:
English
Call no.:
M23500/126
Type:
Conference Proceedings

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