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SYNTHESIS OF HIGHLY PHOTOSENSITIVE a-SiC:H FILMS AT HIGH DEPOSITION RATE BY PLASMA DECOMPOSITION OF SiH4 AND C2H2

Author(s):
Publication title:
Amorphous silicon technology : symposium held April 5-8, 1988, Reno, Nevada, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
118
Pub. Year:
1988
Page(from):
73
Page(to):
78
Pages:
6
Pub. info.:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9780931837883 [093183788X]
Language:
English
Call no.:
M23500/118
Type:
Conference Proceedings

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