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EVIDENCE FOR OXYGEN CONCENTRATION CHANGES INDUCED BY LOW-TEMPERATURE 0-18 IMPLANTATION INTO A SIMOX BURIED-OXIDE LAYER

Author(s):
Scalon, P. J.
Hemment, P. L. F.
Robinson, A. K.
Reeson, K. J.
Chater, R. J.
Kilner, J. A.
Harbeke, G.
2 more
Publication title:
Silicon-on-insulator and buried metals in semiconductors : symposium held November 30-December 3, 1987, Boston, Massachusetts, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
107
Pub. date:
1988
Page(from):
141
Page(to):
146
Pages:
6
Pub. info.:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9780931837753 [0931837758]
Language:
English
Call no.:
M23500/107
Type:
Conference Proceedings

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