KINETIC MODELING OF GRAIN GROWTH IN POLYCRYSTALLINE SILICON FILMS DOPED WITH PHOSPHORUS AND BORON
- Author(s):
- Publication title:
- Polysilicon films and interfaces : symposium held December 1-3, 1987, Boston, Massachusetts, U.S.A.
- Title of ser.:
- Materials Research Society symposium proceedings
- Ser. no.:
- 106
- Pub. Year:
- 1988
- Page(from):
- 143
- Page(to):
- 148
- Pages:
- 6
- Pub. info.:
- Pittsburgh, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9780931837746 [093183774X]
- Language:
- English
- Call no.:
- M23500/106
- Type:
- Conference Proceedings
Similar Items:
Materials Research Society |
Trans Tech Publications |
Materials Research Society |
8
Conference Proceedings
PIEZORESISTIVE PROPERTIES OF BORON-DOPED PECVD MICRO- AND POLYCRYSTALLINE SILICON FILMS
MRS - Materials Research Society |
Materials Research Society |
9
Conference Proceedings
Diffusion of arsenic and phosphorus in laser-processed-polycrystalline-silicon-thin-films
North-Holland |
4
Conference Proceedings
THE EFFECTS OF DOPANTS ON SURFACE-ENERGY-DRIVEN SECONDARY GRAIN GROWTH IN ULTRATHIN Si FILMS
Materials Research Society |
MRS - Materials Research Society |
5
Conference Proceedings
Improvement of Grain Growth and Surface Roughness in Laser-Crystallized Polycrystalline Silicon Films
MRS - Materials Research Society |
11
Conference Proceedings
Silicon-Hydrogen Bonds in Boron and Phosphorous Doped Polycrystalline Silicon Thin Films
Materials Research Society |
MRS - Materials Research Society |
Materials Research Society |