COUPLED DIFFUSION OF ION-IMPLANTED ARSENIC IN SILICON DIOXIDE
- Author(s):
- Publication title:
- SiO[2] and its interfaces : symposium held November 30-December 5, 1987, Boston, Massachusetts, U.S.A.
- Title of ser.:
- Materials Research Society symposium proceedings
- Ser. no.:
- 105
- Pub. Year:
- 1988
- Page(from):
- 91
- Page(to):
- 96
- Pages:
- 6
- Pub. info.:
- Pittsburgh, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9780931837739 [0931837731]
- Language:
- English
- Call no.:
- M23500/105
- Type:
- Conference Proceedings
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