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TWO-PHOTON ABSORPTION CROSS SECTION FOR SILANE UNDER PULSED ArF (193 nm) EXCIMER LASER IRRADIATION

Author(s):
Publication title:
Laser and particle-beam chemical processing for microelectronics : symposium held December 1-3, 1987, Boston, Massachusetts, USA
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
101
Pub. Year:
1988
Page(from):
361
Page(to):
366
Pages:
6
Pub. info.:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9780931837692 [0931837693]
Language:
English
Call no.:
M23500/101
Type:
Conference Proceedings

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