ACTIVATION CHARACTERISTICS OF IMPLANTED DOPANTS IN InAs, GaSb AND GaP AFTER RAPID THERMAL ANNEALING

ACTIVATION CHARACTERISTICS OF IMPLANTED DOPANTS IN InAs, GaSb AND GaP AFTER RAPID THERMAL ANNEALING

Author(s):

Publication title:

Fundamentals of beam-solid interactions and transient thermal processing : symposium held November 30-December 3, 1987, Boston, Massachusetts, U.S.A.

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

100

Pub. Year:

1988

Page(from):

689

Page(to):

694

Pages:

6

Pub. info.:

Pittsburgh, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9780931837685 [0931837685]

Language:

English

Call no.:

M23500/100

Type:

Conference Proceedings

Details

TDL ID:	ZA00015586
Series ID:	PA00000011
Conf. info. (Name):	Symposium on fundamentals of beam-solid interactions and transient thermal processing
Conf. info. (Number):	1987
Conf. info. (Venue):	Boston, MA, USA
Conf. info. (Date):	1987.11.30-1987.12.03

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