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INFLUENCE OF PLASMA EXCITATION FREQUENCY ON DEPOSITION RATE AND ON FILM PROPERTIES FOR HYDROGENATED AMORPHOUS SILICON

Author(s):
Curtins, H.
Wyrach, N.
Favre, M.
Prasad, K.
Brechet, M.
Shah, A. V.
1 more
Publication title:
Amorphous silicon semiconductors -- Pure and hydrogenated : symposium held April 21-24, 1987, Anaheim, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
95
Pub. Year:
1987
Page(from):
249
Page(to):
254
Pages:
6
Pub. info.:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9780931837623 [0931837626]
Language:
English
Call no.:
M23500/95
Type:
Conference Proceedings

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