DEFECTS ANNEALING OF Si+ IMPLANTED GaAs AT RT AND 100°C
- Author(s):
- Publication title:
- Materials modification and growth using Ion beams : symposium held April 21-23, 1987, Anaheim, California, U.S.A.
- Title of ser.:
- Materials Research Society symposium proceedings
- Ser. no.:
- 93
- Pub. Year:
- 1987
- Page(from):
- 67
- Page(to):
- 72
- Pages:
- 6
- Pub. info.:
- Pittsburgh, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9780931837609 [093183760X]
- Language:
- English
- Call no.:
- M23500/93
- Type:
- Conference Proceedings
Similar Items:
Materials Research Society |
7
Conference Proceedings
STEADY-STATE VERSUS RAPID THERMAL ANNEALING OF PHOSPHORUS-IMPLANTED PSEUDOMORPHIC Si(100)/Ge0.12Si0.88
MRS - Materials Research Society |
2
Conference Proceedings
STRAIN AND DAMAGE MEASUREMENTS IN ION IMPLANTED AlXGal-XAs/GaAs SUPERLATTICES
Materials Research Society |
Materials Research Society |
Materials Research Society |
Materials Research Society |
Materials Research Society |
Materials Research Society |
5
Conference Proceedings
ON THE CRITIAL LAYER THICKNESS OF STRAINED-LAYER HETERO-EPITAXIAL CoSi2 FILMS ONF < 111 > Si
Materials Research Society |
11
Conference Proceedings
Dopant activation and epitaxial regrowth in p-implanted pseudomorphic Ge0.12Si0.88 layers on Si(100)
MRS - Materials Research Society |
MRS - Materials Research Society |
12
Conference Proceedings
GENERATION OF DEFECTS AND STRAIN BY ION IMPLANTATION IN Ge(100) SINGLE CRYSTALS, AND IN PSEUDOMORPHIC GeXSi1-X FILMS GROWN ON Si(100)
Materials Research Society |