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ANISOTROPIC AND SELECTIVE REACTIVE ION ETCHING OF SiC IN CHF3 AND OXYGEN PLASMA

Author(s):
Publication title:
Science and technology of microfabrication : symposium held December 4-5, 1986, Boston, Massachusetts, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
76
Pub. Year:
1987
Page(from):
157
Page(to):
162
Pages:
6
Pub. info.:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9780931837425 [0931837421]
Language:
English
Call no.:
M23500/76
Type:
Conference Proceedings

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