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CHEMICALLY-ENHANCED GaAS MASKLESS ETCHING USING A NOVEL FOCUSED ION BEAM ETCHING SYSTEM WITH A CHLORINE MOLECULAR AND RADICAL BEAM

Author(s):
Takado, N.
Asakawa, K.
Arimoto, H.
Morita, T.
Sugata, S.
Miyauchi, E.
Hashimoto, H.
2 more
Publication title:
Photon, beam, and plasma stimulated chemical processes at surfaces : symposium held December 1-4, 1986, Boston, Massachusetts, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
75
Pub. Year:
1987
Page(from):
107
Page(to):
116
Pages:
10
Pub. info.:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9780931837418 [0931837413]
Language:
English
Call no.:
M23500/75
Type:
Conference Proceedings

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