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ANISOTROPIC DRY ETCHING OF SiO2 ON Si ITS IMPACT ON SURFACE AND NEAR-SURFACE PROPERTIES OF THE SUBSTRATE

Author(s):
Oehrlein, G.S.
Coyle, G.J.
Tsang, J.C.
Tromp, R.M.
Clabes, J.G.
Lee, Y.H.
1 more
Publication title:
Plasma processing : symposium held April 15-18, 1986, Palo Alto, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
68
Pub. Year:
1986
Page(from):
367
Page(to):
380
Pages:
14
Pub. info.:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9780931837340 [0931837340]
Language:
English
Call no.:
M23500/68
Type:
Conference Proceedings

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