*DOPANT REDISTRIBUTION DURING SILICIDE FORMATION
- Author(s):
Ohdomari, I. Konuma, K. Takano, M. Chikyow, T. Kawarada, H. Nakanishi, J. Ueno, T. - Publication title:
- Thin films : interfaces and phenomena : symposium held December 2-6, 1985, Boston, Massachusetts, USA
- Title of ser.:
- Materials Research Society symposium proceedings
- Ser. no.:
- 54
- Pub. Year:
- 1985
- Page(from):
- 63
- Page(to):
- 72
- Pages:
- 10
- Pub. info.:
- Pittsburgh, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9780931837197 [0931837197]
- Language:
- English
- Call no.:
- M23500/54
- Type:
- Conference Proceedings
Similar Items:
North-Holland |
Kluwer Academic Publishers |
North-Holland |
SPIE-The International Society for Optical Engineering |
Materials Research Society |
North-Holland |
Materials Research Society |
10
Conference Proceedings
REDISTRIBUTION OF DOPANT AND IMPURITY CONCENTRATIONS DURING THE FORMATION OF UNIFORM WSi2 FILMS BY RTP
Materials Research Society |
SPIE-The International Society for Optical Engineering |
Materials Research Society |
6
Conference Proceedings
The Mesophase Formation During a Dissolution of Cholesterol Monohydrate in Glycochenodeoxycholate-Glycoursodeoxycholate-Lecithin Solutions and Calcium Carbonate …
American Chemical Society |
12
Conference Proceedings
Light Scattering Measurement of Surface Topography During Formation of Titanium Silicide
MRS - Materials Research Society |