THE ANNEALING OF PHOSPHORUS-ION-IMPLANTED COPPER INDIUM DISULFIDE BY A PULSED ELECTRON BEAM
- Author(s):
- Publication title:
- Rapid thermal processing : symposium held December 2-4, 1985, Boston, Massachusetts, U.S.A.
- Title of ser.:
- Materials Research Society symposium proceedings
- Ser. no.:
- 52
- Pub. Year:
- 1985
- Page(from):
- 431
- Page(to):
- 440
- Pages:
- 10
- Pub. info.:
- Pittsburgh, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9780931837173 [0931837170]
- Language:
- English
- Call no.:
- M23500/52
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
STUDIES ON PHOSPHORUS-IMPLANTATION AND THE ANNEALING OF CADMIUM TELLURIDE AND COPPER INDIUM DISULFIDE
Materials Research Society |
7
Conference Proceedings
Pulsed Electron Beam Annealing of GaAs after High Dose Implantation of Hydrogen
Trans Tech Publications |
Materials Research Society |
North Holland |
3
Conference Proceedings
Growth and Characterization of Copper Indium Diselenide Thin Film by Molecular Beam Deposition
MRS - Materials Research Society |
Materials Research Society |
Trans Tech Publications |
North-Holland |
SPIE - The International Society for Optical Engineering |
11
Conference Proceedings
CHARACTIRIZATION OF POLYCRYSTALLINE SILICON GROWN BY GAS-ASITED-SOLIDIFICATION
Materials Research Society |
6
Conference Proceedings
Fabrication of Copper-Indium-Disulfide Films Onto Mo/Glass Substrates Using Pulsed Laser Deposition
Materials Research Society |
Materials Research Society |